產(chǎn)品分類
RTP快速退火設(shè)備
所屬分類：
快速退火爐
概要：
◆ 快速退火爐是利用紅外熱輻射實(shí)現(xiàn)快速加熱的一種半導(dǎo)體熱處理工藝設(shè)備，通過燈光輻射型熱源功率控制模塊裝置和專用燈組對位于工藝腔體的半導(dǎo)體硅片進(jìn)行快速加熱來實(shí)現(xiàn)穩(wěn)定的升溫過程
關(guān)鍵詞：
RTP快速退火
RTP快速退火設(shè)備
產(chǎn)品概述/Product Introduction：
◆ 快速退火爐是利用紅外熱輻射實(shí)現(xiàn)快速加熱的一種半導(dǎo)體熱處理工藝設(shè)備，通過燈光輻射型熱源功率控制模塊裝置和專用燈組對位于工藝腔體的半導(dǎo)體硅片進(jìn)行快速加熱來實(shí)現(xiàn)穩(wěn)定的升溫過程
Rapid annealing furnace is a kind of semiconductor heat treatment equipment which uses infrared heat radiation to realize rapid heating. The semiconductor silicon wafer located in the process cavity is rapid-ly heated by a light radiation type heat source power control module device and a special lamp group to realize a stable heating process
產(chǎn)品特點(diǎn)/Product Characteristics：
◆ 溫度控制精度高、重復(fù)性好
High temperature control precision and good repeatability
◆ 干凈清潔的工藝腔體
Clean and clean process chamber
◆ 用戶可根據(jù)要求定制工藝氣體,最多可配置6路氣體
Users can customize the process gas according to their requirements, and can configure up to 6channels of gas
◆ 工藝過程計(jì)算機(jī)全自動控制
Computer automatic control of technological process
◆ 樣品尺寸:2-6英寸
Sample size: 2-6 inches
◆ 升降溫速率:0-100°C/S可控
Temperature rise and fall rate: 0-100 °c/s controllable
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